NanoCrafters Unite Quiz: Trivia on Nanomanufacturing Techniques

Focused ion beam (FIB) is a nanomanufacturing technique that uses a finely focused beam of ions to carve out patterns on a surface. It is commonly used for precision milling, imaging, and deposition of materials at the nanoscale.

Reactive ion etching (RIE) is a nanomanufacturing technique that uses a combination of chemical and physical etching processes to create intricate patterns on a surface. It is commonly used in the fabrication of microelectromechanical systems (MEMS) and integrated circuits.

Self-assembly is a nanomanufacturing technique where molecules or nanoparticles spontaneously arrange themselves into ordered structures and patterns. It is a bottom-up approach that allows for the creation of functional materials and devices with precise control over their properties.

Nanoimprint lithography is a nanomanufacturing technique that uses a stamp or mold to transfer patterns onto a surface. It involves pressing the mold onto a polymer or other material, which then solidifies to form the desired pattern. It is a cost-effective and high-throughput method for nanoscale patterning.

Molecular beam epitaxy (MBE) is a nanomanufacturing technique that involves the controlled deposition of individual atoms or molecules onto a surface. It is commonly used in the fabrication of high-quality crystalline thin films and semiconductor devices.

Electrospinning is a nanomanufacturing technique that uses an electric field to produce polymer fibers with nanoscale diameters. It involves the extrusion of a polymer solution or melt through a spinneret, while a high voltage is applied, resulting in the stretching and solidification of the polymer into ultrafine fibers.

Atomic force microscopy (AFM) is a nanomanufacturing technique that involves scanning a sharp probe over a surface to measure and manipulate nanoscale objects. It uses a cantilever probe with a sharp tip to detect forces between the tip and the surface, providing high-resolution images and topographic information.

Electrospray deposition is a nanomanufacturing technique that uses a stream of highly charged droplets to deposit nanoparticles onto a surface. The nanoparticles are suspended in a solution and electrostatically charged, causing them to be ejected and deposited onto the target surface. It is commonly used for the fabrication of thin films and coatings.

Self-assembly lithography is a nanomanufacturing technique that combines top-down lithography with bottom-up self-assembly to create complex nanoscale structures. It involves patterning a surface using lithographic techniques and then using self-assembly processes to assemble functional nanoparticles or molecules into the patterned regions.

Electron beam lithography (EBL) is a nanomanufacturing technique that uses a finely focused beam of electrons to create patterns on a surface. It is a high-resolution lithographic method commonly used in the fabrication of nanoscale devices and integrated circuits.